TY - GEN
T1 - Extending endurance of NROM memories to over 10 million program/erase cycles
AU - Roizin, Yakov
AU - Pikhay, Evgeny
AU - Lisiansky, Michael
AU - Heiman, Alexey
AU - Alon, Eli
AU - Aloni, Efraim
AU - Fenigstein, Amos
PY - 2006
Y1 - 2006
N2 - We report on NROM (nitride read only) memory with enhanced endurance/retention. A novel "refresh" is introduced into the cycling algorithm to exclude parasitic electron trapping in the memory transistor. Negative gate pulses are applied when the drain voltage in the erase procedure reaches the threshold value. The memory stack is optimized to allow injection of holes from the substrate through the bottom oxide (BOX). More than 10 million program/erase (P/E) cycles with excellent retention are easily achieved.
AB - We report on NROM (nitride read only) memory with enhanced endurance/retention. A novel "refresh" is introduced into the cycling algorithm to exclude parasitic electron trapping in the memory transistor. Negative gate pulses are applied when the drain voltage in the erase procedure reaches the threshold value. The memory stack is optimized to allow injection of holes from the substrate through the bottom oxide (BOX). More than 10 million program/erase (P/E) cycles with excellent retention are easily achieved.
UR - http://www.scopus.com/inward/record.url?scp=33751038074&partnerID=8YFLogxK
U2 - 10.1109/.2006.1629501
DO - 10.1109/.2006.1629501
M3 - ???researchoutput.researchoutputtypes.contributiontobookanthology.conference???
AN - SCOPUS:33751038074
SN - 1424400260
SN - 9781424400263
T3 - 21st IEEE Non-Volatile Semiconductor Memory Workshop 2006, NVSMW 2006
SP - 74
EP - 75
BT - 21st IEEE Non-Volatile Semiconductor Memory Workshop 2006, NVSMW 2006
T2 - 21st IEEE Non-Volatile Semiconductor Memory Workshop 2006, NVSMW 2006
Y2 - 12 February 2006 through 16 February 2006
ER -