Electron induced dissociation of the NaCl(111) surface

A. Friedenberg*, Y. Shapira

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

20 Scopus citations


Thin NaCl films, epitaxially grown under ultra-high vacuum conditions, were electron bombarded and analyzed by reflection high energy electron diffraction (RHEED), Auger electron spectroscopy (AES) and quadrupole mass spectrometry (QMS). A comprehensive analysis of the results indicates that the impinging electrons cause surface dissociation, and consequently desorption of neutral chlorine and sodium at a rate governed by an Elovich-type mechanism. Simultaneously, the increasing coverage of carbon-oxygen compounds seem to indicate that metallic sodium clusters are formed and oxidized by gas phase residuals, to form a disordered inert layer at the surface. A mechanism of this process is suggested and the implications to subsequent epitaxial growth are discussed.

Original languageEnglish
Pages (from-to)581-594
Number of pages14
JournalSurface Science
Issue number2
StatePublished - 2 Aug 1979


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