Abstract
The effect of electron bombardment on rf-sputtered SnO2 films was studied using mass spectrometry, Auger electron spectroscopy, and conductivity measurements. The studies show that the electron beam causes surface dissociation and subsequent desorption of atomic oxygen. The dissociation is accompanied by corresponding increase of film conductivity, which persists in ultrahigh vacuum conditions and can eliminated by O 2 introduction. A model of the correlated processes is suggested.
Original language | English |
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Pages (from-to) | 5696-5698 |
Number of pages | 3 |
Journal | Journal of Applied Physics |
Volume | 52 |
Issue number | 9 |
DOIs | |
State | Published - 1981 |