Electroless deposition of CoMoP and CoMoB alloy thin films

Y. Sverdlov J. Shklovsky, Y. Shacham-Diamand

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

CoMoP and CoMoB alloys was produced using a simple modification of the commonly used CoP bath. The proposed process is similar to that of electroless CoWP, which have been demonstrated from an electrolyte with sodium tungstate (Na2WO4) or tungsten phosphoric acid (H3[P(W3O10)4]) as a source of the W-ions. In this paper we demonstrate a Co-Mo-P (or B) electroless deposition bath using either cobalt-sulfate and cobalt-dichloride bath under basic conditions (pH-9 for the phosphorous alloy and 12-14 for the boron alloy) using sodium hypophosphite or sodium borohydride as the reducing agents. The refractory metal was introduced to the solutions by adding molybdate ions. The material and electrical properties of the obtained films were characterized and presented here. The deposition process presented here are compatible with microelectronics microfabrication process; thus they can be applied for microelectronics, micro electrical systems (MEMS) or packaging; however their barrier and capping properties for copper metallization are yet to be determined.

Original languageEnglish
Title of host publicationElectroless Deposition
Subtitle of host publicationPrinciples and Applications 4: In Honor of Milan Paunovic and Mordechay Schlesinger
EditorsS. Djokic, L. Magagnin, T. Homma, S. Yoshihara
PublisherElectrochemical Society Inc.
Pages67-76
Number of pages10
Edition34
ISBN (Electronic)9781607687832
DOIs
StatePublished - 2016
EventSymposium on Electroless Deposition: Principles and Applications 4: In Honor of Milan Paunovic and Mordechay Schlesinger - PRiME 2016/230th ECS Meeting - Honolulu, United States
Duration: 2 Oct 20167 Oct 2016

Publication series

NameECS Transactions
Number34
Volume75
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

ConferenceSymposium on Electroless Deposition: Principles and Applications 4: In Honor of Milan Paunovic and Mordechay Schlesinger - PRiME 2016/230th ECS Meeting
Country/TerritoryUnited States
CityHonolulu
Period2/10/167/10/16

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