Electrical resistivity of sub-100 nm Cu films deposited by electroless on self-assembled monolayer of amino-silane activated with Au nano-particles

Evgeny Glickman*, Alexandra Inberg, Nick Fishelson, Tamar Asher, Yosi Shacham-Diamand

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

3 Scopus citations

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Material Science

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Chemical Engineering