Electrical properties of sub-100 nm Cu films deposited by electroless plating on amino-terminated silicon oxide activated with Au nano-particles

A. Inberg*, E. Glickman, T. Asher, N. Fishelson, Y. Shacham-Diamand

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

21 Scopus citations

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Keyphrases

Material Science

Chemical Engineering