Early history of vacuum arc deposition

Raymond L. Boxman

doi:10.1109/27.964470

Early history of vacuum arc deposition

Raymond L. Boxman^*

^*Corresponding author for this work

School of Electrical Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing.

Original language	English
Pages (from-to)	759-761
Number of pages	3
Journal	IEEE Transactions on Plasma Science
Volume	29
Issue number	5 I
DOIs	https://doi.org/10.1109/27.964470
State	Published - Oct 2001

Keywords

Arthur W. Wright
Coatings
History
Thin films
Thomas A. Edison
Vacuum arc

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10.1109/27.964470

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@article{9b325af27c4347c896a4cb2742e5af99,

title = "Early history of vacuum arc deposition",

abstract = "Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing.",

keywords = "Arthur W. Wright, Coatings, History, Thin films, Thomas A. Edison, Vacuum arc",

author = "Boxman, {Raymond L.}",

year = "2001",

month = oct,

doi = "10.1109/27.964470",

language = "אנגלית",

volume = "29",

pages = "759--761",

journal = "IEEE Transactions on Plasma Science",

issn = "0093-3813",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "5 I",

}

TY - JOUR

T1 - Early history of vacuum arc deposition

AU - Boxman, Raymond L.

PY - 2001/10

Y1 - 2001/10

N2 - Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing.

AB - Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing.

KW - Arthur W. Wright

KW - Coatings

KW - History

KW - Thin films

KW - Thomas A. Edison

KW - Vacuum arc

UR - http://www.scopus.com/inward/record.url?scp=0035485554&partnerID=8YFLogxK

U2 - 10.1109/27.964470

DO - 10.1109/27.964470

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.article???

AN - SCOPUS:0035485554

SN - 0093-3813

VL - 29

SP - 759

EP - 761

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

IS - 5 I

ER -

Early history of vacuum arc deposition

Abstract

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