Early history of vacuum arc deposition

Raymond L. Boxman*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing.

Original languageEnglish
Pages (from-to)759-761
Number of pages3
JournalIEEE Transactions on Plasma Science
Issue number5 I
StatePublished - Oct 2001


  • Arthur W. Wright
  • Coatings
  • History
  • Thin films
  • Thomas A. Edison
  • Vacuum arc


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