DNA nanopositioning and alignment by electron-beam-induced surface chemical patterning

Dmitry Klinov, Kirill Atlasov*, Alexander Kotlyar, Benjamin Dwir, Eli Kapon

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Nanopositioning and alignment of arrays of DNA molecules on a surface by combination of high-resolution prepatterning and standard macroscopic deposition is presented. Direct electron beam exposure of a graphite substrate activated by amino groups neutralizes locally the surface charge, preventing the DNA adhesion during the consequent deposition. Because of the high resolution of the electron beam writing process, precise active patches can be created directly on the functionalized surface. Narrow (50 nm) stripe patterns produce both positioning and alignment acting as electrostatic traps for the DNA molecules. The approach is demonstrated using triple- and doubte-stranded DNA of medium length (350 nm). High yield of alignment and regular arrangement of the deposited molecules are achieved in a simple way within large areas.

Original languageEnglish
Pages (from-to)3583-3587
Number of pages5
JournalNano Letters
Volume7
Issue number12
DOIs
StatePublished - Dec 2007

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