TY - GEN
T1 - Directed electroless deposition (ELD) of sub 50 nm interconnects on patterned selfassembled monolayers (SAM)
AU - Fishelson, Nick
AU - Marom, Liron
AU - Inberg, Alexandra
AU - Shacham-Diamand, Yosi
PY - 2008
Y1 - 2008
N2 - 100 nm line features of gold on Si substrate are obtained by transferring a specified pattern by e-beams with characteristic parameters of 10 kV and 500 to 2000 μC/cm2 onto previously CH3-silanized SiO 2 surface, followed by directed NH2-silanization, activation with Au nanoparticles (NPs) from aqueous colloid and Au ELD from sulfite/ascorbate system. In electroless deposition, the novelty of this work is that the technique proposed is based on strong chemical affinity of ultrathin SAMs to catalyst and deposited metal. The organically modified surface is expected to promote both the metal phase lateral growth in ELD and enhanced adhesion of the deposit to molecularly smooth substrate. We introduce also to ELD technology the pre-synthesized mono-dispersions of small catalytic NPs (5 nm) whose mean size is at least by the order of magnitude lower than the characteristic size of the target metal features, which is a reasonable prerequisite for fine feature obtaining.
AB - 100 nm line features of gold on Si substrate are obtained by transferring a specified pattern by e-beams with characteristic parameters of 10 kV and 500 to 2000 μC/cm2 onto previously CH3-silanized SiO 2 surface, followed by directed NH2-silanization, activation with Au nanoparticles (NPs) from aqueous colloid and Au ELD from sulfite/ascorbate system. In electroless deposition, the novelty of this work is that the technique proposed is based on strong chemical affinity of ultrathin SAMs to catalyst and deposited metal. The organically modified surface is expected to promote both the metal phase lateral growth in ELD and enhanced adhesion of the deposit to molecularly smooth substrate. We introduce also to ELD technology the pre-synthesized mono-dispersions of small catalytic NPs (5 nm) whose mean size is at least by the order of magnitude lower than the characteristic size of the target metal features, which is a reasonable prerequisite for fine feature obtaining.
UR - http://www.scopus.com/inward/record.url?scp=55349137367&partnerID=8YFLogxK
M3 - ???researchoutput.researchoutputtypes.contributiontobookanthology.conference???
AN - SCOPUS:55349137367
SN - 9781558999923
T3 - Advanced Metallization Conference (AMC)
SP - 397
EP - 401
BT - Advanced Metallization Conference 2007, AMC 2007
T2 - 24th Session of the Advanced Metallization Conference 2007, AMC 2007
Y2 - 22 October 2007 through 24 October 2007
ER -