Direct low-energy electron beam nanolithography

Daniel Aronov, Gil Rosenman

Research output: Contribution to journalArticlepeer-review

Abstract

We describe here an alternative approach to direct low-energy electron beam nanolithography process with no conventional deposition of any resist or self-assembled monolayer. The method is based on direct formation of ultrathin dielectric layer on electron irradiated surface, without generation of structural defects. High-quality electron-induced patterns with lateral resolutions of about 10 nm are demonstrated on SiO2 surface.

Original languageEnglish
Pages (from-to)2430-2433
Number of pages4
JournalSurface Science
Volume603
Issue number16
DOIs
StatePublished - 15 Aug 2009

Keywords

  • Electron beam
  • Nanolithography

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