Diffusional relaxation in random sequential deposition

Eli Eisenberg*, Asher Baram

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


The effect of diffusional relaxation on the random sequential deposition process is studied in the limit of fast deposition. Expressions for the coverage as a function of time are analytically derived for both the short-time and long-time regimes. These results are tested and compared with numerical simulations.

Original languageEnglish
Pages (from-to)L271-L276
JournalJournal of Physics A: Mathematical and General
Issue number9
StatePublished - 7 May 1997
Externally publishedYes


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