Diffusional relaxation in random sequential deposition

Eli Eisenberg, Asher Baram

Research output: Contribution to journalArticlepeer-review

Abstract

The effect of diffusional relaxation on the random sequential deposition process is studied in the limit of fast deposition. Expressions for the coverage as a function of time are analytically derived for both the short-time and long-time regimes. These results are tested and compared with numerical simulations.

Original languageEnglish
Pages (from-to)L271-L276
JournalJournal of Physics A: Mathematical and General
Volume30
Issue number9
DOIs
StatePublished - 7 May 1997
Externally publishedYes

Fingerprint

Dive into the research topics of 'Diffusional relaxation in random sequential deposition'. Together they form a unique fingerprint.

Cite this