Diffusional relaxation in random sequential deposition

Eli Eisenberg; Asher Baram

doi:10.1088/0305-4470/30/9/003

Diffusional relaxation in random sequential deposition

Eli Eisenberg^*, Asher Baram

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

The effect of diffusional relaxation on the random sequential deposition process is studied in the limit of fast deposition. Expressions for the coverage as a function of time are analytically derived for both the short-time and long-time regimes. These results are tested and compared with numerical simulations.

Original language	English
Pages (from-to)	L271-L276
Journal	Journal of Physics A: Mathematical and General
Volume	30
Issue number	9
DOIs	https://doi.org/10.1088/0305-4470/30/9/003
State	Published - 7 May 1997
Externally published	Yes

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title = "Diffusional relaxation in random sequential deposition",

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Diffusional relaxation in random sequential deposition

Abstract

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