TY - JOUR
T1 - Dependence of zinc oxide thin film properties on filtered vacuum arc deposition parameters
AU - David, T.
AU - Goldsmith, S.
AU - Boxman, R. L.
PY - 2005/7/21
Y1 - 2005/7/21
N2 - The dependence of zinc oxide thin film properties on filtered vacuum arc deposition (FVAD) system was investigated. The films were polycrystalline and the crystal plane varied with the oxygen pressure and arc current, tending to be aligned parallel to the c-axis. Film composition was determined by x-ray photoelectron spectroscopy, which depended weakly on the deposition parameters. The electrical resistivity of the films with larger grain size was higher than that of films with smaller grains, whereas it increased with film stress. The results show that the characteristics of thin ZnO films deposited with FVAD system could be partially effected by adjusting the deposition parameters.
AB - The dependence of zinc oxide thin film properties on filtered vacuum arc deposition (FVAD) system was investigated. The films were polycrystalline and the crystal plane varied with the oxygen pressure and arc current, tending to be aligned parallel to the c-axis. Film composition was determined by x-ray photoelectron spectroscopy, which depended weakly on the deposition parameters. The electrical resistivity of the films with larger grain size was higher than that of films with smaller grains, whereas it increased with film stress. The results show that the characteristics of thin ZnO films deposited with FVAD system could be partially effected by adjusting the deposition parameters.
UR - http://www.scopus.com/inward/record.url?scp=22144437039&partnerID=8YFLogxK
U2 - 10.1088/0022-3727/38/14/017
DO - 10.1088/0022-3727/38/14/017
M3 - ???researchoutput.researchoutputtypes.contributiontojournal.article???
AN - SCOPUS:22144437039
SN - 0022-3727
VL - 38
SP - 2407
EP - 2416
JO - Journal Physics D: Applied Physics
JF - Journal Physics D: Applied Physics
IS - 14
ER -