Copper-induced lipid oxidation in unfractionated plasma: The lag preceding oxidation as a measure of oxidation-resistance

E. Schnitzer, I. Pinchuk, M. Fainaru, Z. Schafer, D. Lichtenberg

Research output: Contribution to journalArticlepeer-review

Abstract

In spite of the pathological significance of oxidation of plasma lipids, no method is currently available for the evaluation of the susceptibility of these lipids to oxidation in unfractionated plasma. Here we demonstrate that copper-induced oxidation of diluted plasma, in the presence of citrate can be monitored continuously by recording the absorbance at 245 nm. The kinetics of accumulation of oxidation products in unfractionated plasma is a sum of lipid oxidation products obtained in low and high density lipoproteins isolated from the same plasma. The kinetic profiles are reproducible and can be performed with plasma samples even after prolonged storage at 4°C (up to two months) or after freezing and thawing of the plasma. Being simple and reproducible, yet correlating with the oxidizability of low and high density lipoproteins, this method can be used to evaluate the “oxidation resistance” of plasma lipids and thus serve as a standard index of the susceptibility of the plasma lipids of patients to oxidation-inflicted pathologies, including atherosclerosis.

Original languageEnglish
Pages (from-to)854-861
Number of pages8
JournalBiochemical and Biophysical Research Communications
Volume216
Issue number3
DOIs
StatePublished - 22 Nov 1995

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