TY - JOUR
T1 - Controlling nanoslot overlimiting current with the depth of a connecting microchamber
AU - Yossifon, G.
AU - Mushenheim, P.
AU - Chang, H. C.
PY - 2010/6
Y1 - 2010/6
N2 - The overlimiting ion flux, in excess of the limiting-value stipulated by diffusion, across a wide nanoslot (of fixed depth) is shown to be sensitively dependent on the depth of the connecting microchamber at one end of the nanoslot, which controls the onset of a vortex instability that specifies the dimension of the concentration polarization layer responsible for overlimiting behavior. Simple scaling arguments relating the microchamber depth to the effective fluid viscosity produce experimentally verified scaling dependence of the polarization layer length, the onset voltage for overlimiting behavior and the overlimiting current on the microchamber depth.
AB - The overlimiting ion flux, in excess of the limiting-value stipulated by diffusion, across a wide nanoslot (of fixed depth) is shown to be sensitively dependent on the depth of the connecting microchamber at one end of the nanoslot, which controls the onset of a vortex instability that specifies the dimension of the concentration polarization layer responsible for overlimiting behavior. Simple scaling arguments relating the microchamber depth to the effective fluid viscosity produce experimentally verified scaling dependence of the polarization layer length, the onset voltage for overlimiting behavior and the overlimiting current on the microchamber depth.
UR - http://www.scopus.com/inward/record.url?scp=78751649651&partnerID=8YFLogxK
U2 - 10.1209/0295-5075/90/64004
DO - 10.1209/0295-5075/90/64004
M3 - מאמר
AN - SCOPUS:78751649651
VL - 90
JO - Journal de Physique (Paris), Lettres
JF - Journal de Physique (Paris), Lettres
SN - 0295-5075
IS - 6
M1 - 64004
ER -