Conductivity of Weakly Insulating Amorphous Nickel-Silicon Films below the Metal-Insulator Transition

A. Heines*, M. Karpovski, M. Pilosof, M. Witcomb, R. Rosenbaum

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The electronic conductivity has been measured in homogeneous, weakly insulating, amorphous nickel-silicon films located just below the metal-insulator transition (MIT). The conductivity follows a simple CTz power law dependence with z ≈ 1/2 over a large temperature interval. The CTz behavior can be explained using the scaling theory suggested by Di Castro. A Mott variable-range hopping law cannot be fitted successfully through the zero field data.

Original languageEnglish
Pages (from-to)237-240
Number of pages4
JournalPhysica Status Solidi (B): Basic Research
Volume205
Issue number1
DOIs
StatePublished - Jan 1998

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