Comparison of thin films ofYBa₂Cu₃O_7-x deposited by physical (laser ablation) and chemical (OMCVD) methods for device applications

Engineering & Materials Science

• Organometallics 100%
• Laser ablation 96%
• Chemical vapor deposition 76%
• Thin films 62%
• Pulsed laser deposition 51%
• Buffer layers 31%
• Scanning tunneling microscopy 19%
• Epilayers 18%
• Substrates 15%
• Sapphire 14%
• X ray diffraction 10%
• Aluminum oxide 10%
• Surface roughness 9%
• Temperature 8%
• Scanning electron microscopy 8%

Chemistry

• Laser Ablation 73%
• Chemical Vapour Deposition 59%
• Metallocene 58%
• Pulsed Laser Deposition 43%
• Liquid Film 31%
• Application 20%
• Buffer Solution 14%
• Critical Temperature 12%
• Scanning Tunneling Microscopy 11%
• Current Density 8%
• Scanning Electron Microscopy 6%
• X-Ray Diffraction 5%
• Surface 3%

Physics & Astronomy

• laser ablation 63%
• vapor deposition 50%
• thin films 33%
• pulsed laser deposition 31%
• buffers 18%
• scanning tunneling microscopy 10%
• critical current 10%
• critical temperature 9%
• sapphire 9%
• roughness 9%
• preparation 8%
• current density 7%
• scanning electron microscopy 7%
• diffraction 5%
• x rays 4%