Comparison of thin films ofYBa2Cu3O7-x deposited by physical (laser ablation) and chemical (OMCVD) methods for device applications

M. Schieber*, S. C. Han, Y. Ariel, S. Chokron, T. Tsach, M. Maharizi, C. Deutscher, D. Racah, A. Raizman, S. Rotter

*Corresponding author for this work

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