Comparison of bulk and interface generation in silicon PIN detectors

A. Ruzin*, S. Marunko, T. Tilchyn

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

4 Scopus citations

Abstract

Thermal activation energies of bulk and interface-generated currents for high-resistivity silicon detectors are presented and compared. In non-irradiated devices it is shown that the bulk generation activation energy is strongly dependent on the processing technology, with no significant influence of material resistivity. The activation energies of the interface-generated currents on the other hand are shown to be process, resistivity, and orientation independent. The concentration cross-section products of both bulk and interface-generation centers are shown to be process dependent. Samples with resistivity range of 2-28 kΩ cm and orientations 〈1 1 1〉 and 〈1 0 0〉 were used. The activation energies of the current generating centers of proton-irradiated samples are presented.

Original languageEnglish
Pages (from-to)21-29
Number of pages9
JournalNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume512
Issue number1-2
DOIs
StatePublished - 11 Oct 2003
EventProceedings of the 9th European Symposium on Semiconductor - Elmau, Germany
Duration: 23 Jul 200227 Jul 2002

Funding

FundersFunder number
Israeli Ministry of Industry and Commerce and Jordan Valley Applied Radiation Inc

    Keywords

    • Activation energy
    • Gated diodes
    • Interface generation
    • Si/SiO interface

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