TY - GEN
T1 - COMBINED ELLIPSOMETRIC AND AC IMPEDANCE MEASUREMENTS OF OXIDE FILMS ON RUTHENIUM.
AU - Rishpon, J.
AU - Reshef, I.
AU - Gottesfeld, S.
PY - 1983
Y1 - 1983
N2 - An instrumental setup for the in-situ characterization of surface films is described. A microprocessor is used for the experimental control, data acquisition and data analysis in automated measurements of the ellipsometric parameters and of the ac impedance ('network analysis'). Results for oxide films grown on Ru metal are described. The mode of film growth is shown to have a clear effect on the optical properties of the oxide, reflecting the degree of porosity and hydration. The ac impedance measurements in electrolytes of different acid concentrations show that the larger part of the Ru oxide charge capacity depends on the supply of protons from solution. (Edited author abstract. )
AB - An instrumental setup for the in-situ characterization of surface films is described. A microprocessor is used for the experimental control, data acquisition and data analysis in automated measurements of the ellipsometric parameters and of the ac impedance ('network analysis'). Results for oxide films grown on Ru metal are described. The mode of film growth is shown to have a clear effect on the optical properties of the oxide, reflecting the degree of porosity and hydration. The ac impedance measurements in electrolytes of different acid concentrations show that the larger part of the Ru oxide charge capacity depends on the supply of protons from solution. (Edited author abstract. )
UR - http://www.scopus.com/inward/record.url?scp=0020978915&partnerID=8YFLogxK
U2 - 10.1016/b978-0-444-42252-1.50037-0
DO - 10.1016/b978-0-444-42252-1.50037-0
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AN - SCOPUS:0020978915
SN - 0444422528
SN - 9780444422521
T3 - Thin Films Science and Technology
SP - 205
EP - 210
BT - Thin Films Science and Technology
PB - Elsevier
ER -