COMBINED ELLIPSOMETRIC AND AC IMPEDANCE MEASUREMENTS OF OXIDE FILMS ON RUTHENIUM.

J. Rishpon*, I. Reshef, S. Gottesfeld

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

An instrumental setup for the in-situ characterization of surface films is described. A microprocessor is used for the experimental control, data acquisition and data analysis in automated measurements of the ellipsometric parameters and of the ac impedance ('network analysis'). Results for oxide films grown on Ru metal are described. The mode of film growth is shown to have a clear effect on the optical properties of the oxide, reflecting the degree of porosity and hydration. The ac impedance measurements in electrolytes of different acid concentrations show that the larger part of the Ru oxide charge capacity depends on the supply of protons from solution. (Edited author abstract. )

Original languageEnglish
Title of host publicationThin Films Science and Technology
PublisherElsevier
Pages205-210
Number of pages6
ISBN (Print)0444422528, 9780444422521
DOIs
StatePublished - 1983

Publication series

NameThin Films Science and Technology
ISSN (Print)0168-2075

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