Characterization of interface and bulk oxide traps in SiC MOSFETs with epitaxialy grown and implanted channels

M. Gurfinkel, Jinwoo Kim, S. Potbhare, H. D. Xiong, K. P. Cheung, J. Suehle, J. B. Bernstein, Yoram Shapira, A. J. Lelis, D. Habersat, N. Goldsman

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Original languageEnglish
Title of host publication2007 IEEE International Integrated Reliability Workshop Final Report, IRW
Pages111-113
Number of pages3
DOIs
StatePublished - 2007
Event2007 IEEE International Integrated Reliability Workshop, IRW - S. Lake Tahoe, CA, United States
Duration: 15 Oct 200718 Oct 2007

Publication series

NameIEEE International Integrated Reliability Workshop Final Report

Conference

Conference2007 IEEE International Integrated Reliability Workshop, IRW
Country/TerritoryUnited States
CityS. Lake Tahoe, CA
Period15/10/0718/10/07

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