Original language | English |
---|---|
Title of host publication | Advanced Nanoscale ULSI Interconnects |
Subtitle of host publication | Fundamentals and Applications |
Editors | Yosi Shacham-Diamand, Tetsuya Osaka, Madhav Datta, Takayuki Ohba |
Place of Publication | New York, NY |
Publisher | Springer New York; Imprint: Springer |
Chapter | 1 |
Pages | 3-11 |
Edition | 1st ed. 2009 |
ISBN (Electronic) | 0387958681, 978-0-387-95868-2 |
ISBN (Print) | 978-0-387-95867-5 |
DOIs | |
State | Published - 2009 |
ULI Keywords
- uli
- Chemical engineering
- Electrical engineering
- Electrochemistry
- Materials science
- Nanotechnology
- הנדסת חשמל
- אלקטרוכימיה
- ננוטכנולוגיה
- Chemistry, Industrial
- Engineering, Chemical
- Industrial chemistry -- Chemical engineering
- Electric engineering
- Material science
- Molecular technology
- Nanoscale technology