Cathodoluminescence studies of electron injection effects in p-type gallium oxide

Leonid Chernyak*, Alfons Schulte, Jian Sian Li, Chao Ching Chiang, Fan Ren, Stephen J. Pearton, Corinne Sartel, Vincent Sallet, Zeyu Chi, Yves Dumont, Ekaterine Chikoidze, Arie Ruzin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

It has recently been demonstrated that electron beam injection into p-type β-gallium oxide leads to a significant linear increase in minority carrier diffusion length with injection duration, followed by its saturation. The effect was ascribed to trapping of non-equilibrium electrons (generated by a primary electron beam) at meta-stable native defect levels in the material, which in turn blocks recombination through these levels. In this work, in contrast to previous studies, the effect of electron injection in p-type Ga2O3 was investigated using cathodoluminescence technique in situ in scanning electron microscope, thus providing insight into minority carrier lifetime behavior under electron beam irradiation. The activation energy of ∼0.3 eV, obtained for the phenomenon of interest, is consistent with the involvement of Ga vacancy-related defects.

Original languageEnglish
Article number085103
JournalAIP Advances
Volume14
Issue number8
DOIs
StatePublished - 1 Aug 2024

Funding

FundersFunder number
CNRS
US-Israel BSF
Department of the Defense
French National Agency of Research
NSFECCS2341747, ECCS2427262, ECCS2310285
US–Israel BSF2022056
Defense Threat Reduction AgencyHDTRA1-20-2-0002
ANRCE-50 N0015-01
NATOG6194, G6072

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