Binary joint transform correlation using error-diffusion techniques

Hanni Inbar*, Emanuel Marom, Naim Konforti

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Optical pattern recognition techniques based on the optical joint transform correlator (JTC) scheme are attractive due to their simplicity. Recent improvements in spatial light modulators (SLM) increased the popularity of the JTC, providing means for real time operation. Using a binary SLM for the display of the Fourier spectrum, first requires binarization of the joint power spectrum distribution. Although hard-clipping is the simplest and most common binarization method used, we suggest to apply error-diffusion as an improved binarization technique. The performance of a binary JTC, whose input image is considered to contain additive zero-mean white Gaussian noise, is investigated. Various ways for nonlinearly modifying the joint power spectrum prior to the binarization step, which is based on either error-diffusion or hard-clipping techniques, are discussed. These nonlinear modifications aim at increasing the contrast of the interference fringes at the joint power spectrum plane, leading to better definition of the correlation signal. Mathematical analysis, computer simulations and experimental results are presented.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsItzhak Shladov, Yitzhak Weissman, Moshe Oron
PublisherPubl by Society of Photo-Optical Instrumentation Engineers
Pages175-186
Number of pages12
ISBN (Print)081941218X
StatePublished - 1993
Event8th Meeting on Optical Engineering on Israel: Optoelectronics and Applications in Industry and Medicine - Tel Aviv, Isr
Duration: 14 Dec 199216 Dec 1992

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume1972
ISSN (Print)0277-786X

Conference

Conference8th Meeting on Optical Engineering on Israel: Optoelectronics and Applications in Industry and Medicine
CityTel Aviv, Isr
Period14/12/9216/12/92

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