Assessment of lithographic process variation effects in InGaAsP annular Bragg resonator lasers

William M.J. Green, Jacob Scheuer, Guy A. DeRose*, Amnon Yariv, Axel Scherer

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Optical microresonators based on an annular geometry of radial Bragg reflectors have been designed and fabricated by electron-beam lithography, reactive ion etching, and an epitaxial transfer process. Unlike conventional ring resonators that are based on total internal reflection of light, the annular structure described here is designed to support optical modes with very small azimuthal propagation coefficient and correspondingly large free spectral range. The effect of lithographic process variation upon device performance is studied. Laser emission wavelength and threshold optical pump power are found to vary between similar devices given different electron doses during electron-beam lithography. As the resonance wavelength and quality factor of these resonators are very sensitive to environmental changes, these resonators make ideal active light sources that can be integrated into large arrays for gas and liquid sensing applications and are easily interrogated.

Original languageEnglish
Pages (from-to)3206-3209
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number6
DOIs
StatePublished - Nov 2004
Externally publishedYes

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