Assessing the performance of two-dimensional dopant profiling techniques

N. Duhayon, P. Eyben, M. Fouchier, T. Clarysse, W. Vandervorst, D. Álvarez, S. Schoemann, M. Ciappa, M. Stangoni, W. Fichtner, P. Formanek, M. Kittler, V. Raineri, F. Giannazzo, D. Goghero, Y. Rosenwaks, R. Shikler, S. Saraf, S. Sadewasser, N. BarreauT. Glatzel, M. Verheijen, S. A.M. Mentink, M. Von Sprekelsen, T. Maltezopoulos, R. Wiesendanger, L. Hellemans

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)385-393
Number of pages9
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number1
DOIs
StatePublished - 2004

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