Abstract
By employing a precise method for locating and directly imaging the active switching region in a resistive random access memory (RRAM) device, a nanoscale conducting channel consisting of an amorphous Ta(O) solid solution surrounded by nearly stoichiometric Ta 2O 5 is observed. Structural and chemical analysis of the channel combined with temperature-dependent transport measurements indicate a unique resistance switching mechanism.
Original language | English |
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Pages (from-to) | 5633-5640 |
Number of pages | 8 |
Journal | Advanced Materials |
Volume | 23 |
Issue number | 47 |
DOIs | |
State | Published - 15 Dec 2011 |
Externally published | Yes |
Keywords
- memory
- oxides
- resistive random access memory (RRAM)
- switches