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A surface adsorption model for electroless cobalt alloy thin films
Y. Shacham-Diamand
*
, Y. Sverdlov
, V. Bogush
, R. Ofek-Almog
*
Corresponding author for this work
Department of Electrical Engineering - Physical Eng.
Waseda University
Tel Aviv University
Belarusian State University of Informatics and Radioelectronics
Research output
:
Contribution to journal
›
Article
›
peer-review
25
Scopus citations
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Keyphrases
Reducing Agent
100%
Electroless Cobalt
100%
Cobalt Alloys
100%
Alloy Thin Films
100%
Adsorption Model
100%
Surface Adsorption
100%
Solution Composition
25%
Deposition Rate
25%
Material Properties
25%
Electroless Deposition
25%
Boron
25%
Film Composition
25%
Electrical Resistance
25%
Dimethylamine Borane
25%
Sodium Hypophosphite
25%
Thin Barrier Layer
25%
Via Contacts
25%
Material Composition
25%
Contact Line
25%
Co-adsorption
25%
Barrier Layer
25%
Ultralarge-scale Integration
25%
Film Roughness
25%
Alloy Films
25%
Adsorption Rate
25%
Cu Line
25%
Self-activated
25%
Ultra-thin Barrier
25%
Composition Effect
25%
Element Profile
25%
Material Science
Thin Films
100%
Reducing Agent
100%
Surface (Surface Science)
100%
Cobalt Alloy
100%
Film
75%
Electroless Deposition
25%
Boron
25%
Sodium
25%
Electrical Resistance
25%
Composition Effect
25%
Materials Property
25%
Engineering
Thin Films
100%
Experimental Result
66%
Barrier Layer
66%
Interconnects
33%
Deposition Rate
33%
Sodium Hypophosphite
33%
Boran
33%
ULSI Circuits
33%
Electroless Plating
33%
Chemical Engineering
Film
100%
Adsorption Model
100%
Electroless Plating
16%
Deposition Rate
16%
Co-adsorption
16%