A new single-layer plasma-developable photoresist using the catalysed crosslinking of poly(4-hydroxystyrene) via photogenerated acid

James T. Fahey, Jean M.J. Fréchet*, Yosef Shacham-Diamand

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

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Keyphrases

Engineering

Chemistry

Material Science

Chemical Engineering