TY - JOUR
T1 - A new single-layer plasma-developable photoresist using the catalysed crosslinking of poly(4-hydroxystyrene) via photogenerated acid
AU - Fahey, James T.
AU - Fréchet, Jean M.J.
AU - Shacham-Diamand, Yosef
PY - 1994
Y1 - 1994
N2 - A new single-layer, dry developable chemically amplified resist is described. The resist consists of poly(4-hydroxystyrene), 1,2,4,5- tetra(acetoxymethyl)benzene and triphenylsulfonium hexafluoroantimonate, and functions via crosslinking as a result of an acid-catalysed electrophilic aromatic substitution reaction. In contrast to the normal wet resist development process that leads to a negative-tone image, a gas-phase modification of the exposed polymer film, followed by reactive oxygen etching, leads to a positive-tone image. The post-exposure modification is accomplished using gaseous 1,1,1,3,3,3-hexamethyldisilazane, a reagent that is able to diffuse selectively into the non-exposed, non-crosslinked regions of the polymer film to react with the poly(4-hydroxystyrene) and form silyl ethers. Dry-development of the treated film in an O2 plasma removes those areas of the film that have remained unsilylated, producing a positive-tone relief image.
AB - A new single-layer, dry developable chemically amplified resist is described. The resist consists of poly(4-hydroxystyrene), 1,2,4,5- tetra(acetoxymethyl)benzene and triphenylsulfonium hexafluoroantimonate, and functions via crosslinking as a result of an acid-catalysed electrophilic aromatic substitution reaction. In contrast to the normal wet resist development process that leads to a negative-tone image, a gas-phase modification of the exposed polymer film, followed by reactive oxygen etching, leads to a positive-tone image. The post-exposure modification is accomplished using gaseous 1,1,1,3,3,3-hexamethyldisilazane, a reagent that is able to diffuse selectively into the non-exposed, non-crosslinked regions of the polymer film to react with the poly(4-hydroxystyrene) and form silyl ethers. Dry-development of the treated film in an O2 plasma removes those areas of the film that have remained unsilylated, producing a positive-tone relief image.
UR - http://www.scopus.com/inward/record.url?scp=0001687647&partnerID=8YFLogxK
U2 - 10.1039/JM9940401533
DO - 10.1039/JM9940401533
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AN - SCOPUS:0001687647
SN - 0959-9428
VL - 4
SP - 1533
EP - 1538
JO - Journal of Materials Chemistry
JF - Journal of Materials Chemistry
IS - 10
ER -