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A model for the growth of cdte by metal organic chemical vapor deposition
Y. Nemirovsky
*
, D. Goren,
A. Ruzin
*
Corresponding author for this work
Technion-Israel Institute of Technology
Research output
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Contribution to journal
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Article
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peer-review
13
Scopus citations
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Dive into the research topics of 'A model for the growth of cdte by metal organic chemical vapor deposition'. Together they form a unique fingerprint.
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Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Metal Organic Chemical Vapor Deposition
100%
Experimental Result
50%
Square Root
50%
Gas-Phase
50%
Temperature Range
50%
Kinetic Model
50%
Pyrolysis
50%
Phase Concentration
50%
Major Feature
50%
Keyphrases
Growth Rate
100%
Cadmium Telluride
100%
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
Chemical Vapor Deposition Growth
50%
High Concentration
25%
Major Features
25%
Kinetic Model
25%
Square Root
25%
Wide Temperature Range
25%
Surface Control
25%
Controlled Pyrolysis
25%
Gas-phase Concentration
25%
Stepped Surfaces
25%
Surface Saturation
25%
Chemical Engineering
Vapor Deposition
100%
Chemical Vapor Deposition
100%
Metallorganic Chemical Vapor Deposition
100%
Pyrolysis
50%
Earth and Planetary Sciences
Metalorganic Chemical Vapor Deposition
100%
Pyrolysis
33%
Vapor Phase
33%