A Model For a Uniform Steady-State Vacuum Arc With a Hot Anode

Raymond L. Boxman; S. Goldsmith

doi:10.1109/27.41177

A Model For a Uniform Steady-State Vacuum Arc With a Hot Anode

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Abstract

A model is formulated and evaluated for a uniform electrical discharge sustained in vapor evaporated from an arc-heated anode. The plasma potential is positive with respect to both the cathode and anode. For a Cu anode, the anodic vapor will dominate the plasma for current densities exceeding 8 kA/m². The anode heating potential is approximately 6.5 V, and the predominate cooling mechanism is evaporation for current densities exceeding 20 kA/m². Over the range 10 to 10 000 kA/m², the electron density increases from 8 x 10¹⁷ to 5 ×10²³ m^-3, while the ionization fraction rises from 0.3 to 4 percent. At the lower end of this current range the electrical resistivity of 4 mΩ-m is determined primarily by electron-neutral collisions, while with increasing current the resistivity decreases to 0.7 mΩ-m, with electronion collisions contributing an equal share. This hot-anode vacuum arc may have potential for industrial application as a macroparticle-frec high deposition rate coating source.

Original language	English
Pages (from-to)	661-665
Number of pages	5
Journal	IEEE Transactions on Plasma Science
Volume	17
Issue number	5
DOIs	https://doi.org/10.1109/27.41177
State	Published - Oct 1989
Externally published	Yes

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@article{8c570bced06f419fad0d49df3914b308,

title = "A Model For a Uniform Steady-State Vacuum Arc With a Hot Anode",

abstract = "A model is formulated and evaluated for a uniform electrical discharge sustained in vapor evaporated from an arc-heated anode. The plasma potential is positive with respect to both the cathode and anode. For a Cu anode, the anodic vapor will dominate the plasma for current densities exceeding 8 kA/m2. The anode heating potential is approximately 6.5 V, and the predominate cooling mechanism is evaporation for current densities exceeding 20 kA/m2. Over the range 10 to 10 000 kA/m2, the electron density increases from 8 x 1017 to 5 ×1023 m-3, while the ionization fraction rises from 0.3 to 4 percent. At the lower end of this current range the electrical resistivity of 4 mΩ-m is determined primarily by electron-neutral collisions, while with increasing current the resistivity decreases to 0.7 mΩ-m, with electronion collisions contributing an equal share. This hot-anode vacuum arc may have potential for industrial application as a macroparticle-frec high deposition rate coating source.",

author = "Boxman, {Raymond L.} and S. Goldsmith",

note = "Funding Information: Manuscript received October 26, 1988; revised January 30, 1989. This work was sponsored by the Foundation for Research in Electronics, Computers, and Communications, administered by the Israel Academy of Sciences and Humanities. R. L. Boxman is with the Electrical Discharge and Plasma Laboratory, Tel Aviv University, P.O.B. 39040, Tel Aviv 69978, Israel. He is currently on sabbatical at the Department of Electrical and Computer Engineering, Drexel University, Philadelphia, PA 19 104. S. Goldsmith is with the Electrical Discharge and Plasma Laboratory, Tel Aviv University, P.O.B. 39040, Tel Aviv 69978, Israel. IEEE Log Number 8930195. *MKS units used throughout. All U's and T, in eV or V; To in K.",

year = "1989",

month = oct,

doi = "10.1109/27.41177",

language = "אנגלית",

volume = "17",

pages = "661--665",

journal = "IEEE Transactions on Plasma Science",

issn = "0093-3813",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "5",

}

TY - JOUR

T1 - A Model For a Uniform Steady-State Vacuum Arc With a Hot Anode

AU - Boxman, Raymond L.

AU - Goldsmith, S.

N1 - Funding Information: Manuscript received October 26, 1988; revised January 30, 1989. This work was sponsored by the Foundation for Research in Electronics, Computers, and Communications, administered by the Israel Academy of Sciences and Humanities. R. L. Boxman is with the Electrical Discharge and Plasma Laboratory, Tel Aviv University, P.O.B. 39040, Tel Aviv 69978, Israel. He is currently on sabbatical at the Department of Electrical and Computer Engineering, Drexel University, Philadelphia, PA 19 104. S. Goldsmith is with the Electrical Discharge and Plasma Laboratory, Tel Aviv University, P.O.B. 39040, Tel Aviv 69978, Israel. IEEE Log Number 8930195. *MKS units used throughout. All U's and T, in eV or V; To in K.

PY - 1989/10

Y1 - 1989/10

N2 - A model is formulated and evaluated for a uniform electrical discharge sustained in vapor evaporated from an arc-heated anode. The plasma potential is positive with respect to both the cathode and anode. For a Cu anode, the anodic vapor will dominate the plasma for current densities exceeding 8 kA/m2. The anode heating potential is approximately 6.5 V, and the predominate cooling mechanism is evaporation for current densities exceeding 20 kA/m2. Over the range 10 to 10 000 kA/m2, the electron density increases from 8 x 1017 to 5 ×1023 m-3, while the ionization fraction rises from 0.3 to 4 percent. At the lower end of this current range the electrical resistivity of 4 mΩ-m is determined primarily by electron-neutral collisions, while with increasing current the resistivity decreases to 0.7 mΩ-m, with electronion collisions contributing an equal share. This hot-anode vacuum arc may have potential for industrial application as a macroparticle-frec high deposition rate coating source.

AB - A model is formulated and evaluated for a uniform electrical discharge sustained in vapor evaporated from an arc-heated anode. The plasma potential is positive with respect to both the cathode and anode. For a Cu anode, the anodic vapor will dominate the plasma for current densities exceeding 8 kA/m2. The anode heating potential is approximately 6.5 V, and the predominate cooling mechanism is evaporation for current densities exceeding 20 kA/m2. Over the range 10 to 10 000 kA/m2, the electron density increases from 8 x 1017 to 5 ×1023 m-3, while the ionization fraction rises from 0.3 to 4 percent. At the lower end of this current range the electrical resistivity of 4 mΩ-m is determined primarily by electron-neutral collisions, while with increasing current the resistivity decreases to 0.7 mΩ-m, with electronion collisions contributing an equal share. This hot-anode vacuum arc may have potential for industrial application as a macroparticle-frec high deposition rate coating source.

UR - http://www.scopus.com/inward/record.url?scp=0024751355&partnerID=8YFLogxK

U2 - 10.1109/27.41177

DO - 10.1109/27.41177

M3 - מאמר

AN - SCOPUS:0024751355

VL - 17

SP - 661

EP - 665

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

SN - 0093-3813

IS - 5

ER -

A Model For a Uniform Steady-State Vacuum Arc With a Hot Anode

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