TY - JOUR
T1 - A low-jitter 1.8-kV 100-ps rise-time 50-kHz repetition-rate pulsed-power generator
AU - Merensky, Lev M.
AU - Kardo-Sysoev, Alexei F.
AU - Flerov, Alexander N.
AU - Pokryvailo, Alex
AU - Shmilovitz, Doron
AU - Kesar, Amit S.
PY - 2009
Y1 - 2009
N2 - A 1.8-kV 100-ps rise-time pulsed-power generator operating at a repetition frequency of 50 kHz is presented. The generator consists of three compression stages. In the first stage, a power MOSFET produces high voltage by breaking an inductor current. In the second stage, a 3-kV drift-step-recovery diode cuts the reverse current rapidly to create a 1-ns rise-time pulse. In the last stage, a silicon-avalanche shaper is used as a fast 100-ps closing switch. Experimental investigation showed that, by optimizing the generator operating point, the shot-to-shot jitter can be reduced to less than 13 ps. The theoretical model of the pulse-forming circuit is presented.
AB - A 1.8-kV 100-ps rise-time pulsed-power generator operating at a repetition frequency of 50 kHz is presented. The generator consists of three compression stages. In the first stage, a power MOSFET produces high voltage by breaking an inductor current. In the second stage, a 3-kV drift-step-recovery diode cuts the reverse current rapidly to create a 1-ns rise-time pulse. In the last stage, a silicon-avalanche shaper is used as a fast 100-ps closing switch. Experimental investigation showed that, by optimizing the generator operating point, the shot-to-shot jitter can be reduced to less than 13 ps. The theoretical model of the pulse-forming circuit is presented.
KW - Drift-step-recovery diode (DSRD)
KW - Pulse generation
KW - Pulse shaping circuits
KW - Silicon-avalanche shaper (SAS)
KW - Subnanosecond
KW - Ultrawideband radiation
UR - http://www.scopus.com/inward/record.url?scp=70349556434&partnerID=8YFLogxK
U2 - 10.1109/TPS.2009.2025377
DO - 10.1109/TPS.2009.2025377
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AN - SCOPUS:70349556434
SN - 0093-3813
VL - 37
SP - 1855
EP - 1862
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
IS - 9 PART 2
ER -