A facile chemoselective deprotection of aryl silyl ethers using sodium hydride/DMF and in situ protection of phenol with various groups

Rodney A. Fernandes*, Sachin P. Gholap, Sandip V. Mulay

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

An efficient method for the selective removal of aryl silyl protection using NaH in DMF solvent is developed. The method is rapid, operationally simple and can be carried out at room temperature. Excellent chemoselectivity and high yields of phenol products are other advantages of this method. A one-pot desilylation and reprotection as aryl alkyl ethers and esters has also been demonstrated.

Original languageEnglish
Pages (from-to)16438-16443
Number of pages6
JournalRSC Advances
Volume4
Issue number32
DOIs
StatePublished - 2014
Externally publishedYes

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