Abstract
An efficient method for the selective removal of aryl silyl protection using NaH in DMF solvent is developed. The method is rapid, operationally simple and can be carried out at room temperature. Excellent chemoselectivity and high yields of phenol products are other advantages of this method. A one-pot desilylation and reprotection as aryl alkyl ethers and esters has also been demonstrated.
Original language | English |
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Pages (from-to) | 16438-16443 |
Number of pages | 6 |
Journal | RSC Advances |
Volume | 4 |
Issue number | 32 |
DOIs | |
State | Published - 2014 |
Externally published | Yes |