3D whispering-gallery-mode microlasers by direct laser writing and subsequent soft nanoimprint lithography

Philipp Brenner*, Ofer Bar-On, Tobias Siegle, Tobias Leonhard, Raz Gvishi, Carsten Eschenbaum, Heinz Kalt, Jacob Scheuer, Uli Lemmer

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

We demonstrate the realization of 3D whispering-gallery-mode (WGM) microlasers by direct laser writing (DLW) and their replication by nanoimprint lithography using a soft mold technique ("soft NIL"). The combination of DLW as a method for rapid prototyping and soft NIL offers a fast track towards large scale fabrication of 3D passive and active optical components applicable to a wide variety of materials. A performance analysis shows that surface-scattering-limited Q-factors of replicated resonators as high as 1 × 105 at 635 nm can be achieved with this process combination. Lasing in the replicated WGM resonators is demonstrated by the incorporation of laser dyes in the target material. Low lasing thresholds in the order of 15 kW/cm2 are obtained under ns-pulsed excitation.

Original languageEnglish
Pages (from-to)3703-3742
Number of pages40
JournalApplied Optics
Volume56
Issue number13
DOIs
StatePublished - 1 May 2017

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