TY - JOUR
T1 - 2. An uhv system for in situ preparation and analysis of thin films and surfaces
AU - Shapira, Y.
AU - Grünbaum, E.
N1 - Funding Information:
We are grateful to Professor G Deutscher for his support during the development of this project. The project was supported by a grant from the United States-Israel Binational Science Foundation (BSF), Jerusalem, Israel, by a grant from the National Council for Research and Development, Israel and the KFA Jtilich, Germany and by a grant from the Israeli Center for Absorption of Scientists. The technical help of S Carmeli and Y Saltzman is greatly appreciated.
PY - 1978/12
Y1 - 1978/12
N2 - A versatile uhv system was designed in order to enable the preparation of thin films of different materials and their analysis to be undertaken. It includes various sources for evaporation: a high-power electron gun, conventional crucibles and Knudsen cells. An airlock is available for fast transfer of prepared films and new substrates. By a special sample holder the thin films can be manipulated to different positions for structural analysis by reflection high energy electron diffraction (RHEED), and for chemical analysis by Auger electron spectroscopy (AES) and secondary ion mass spectrometry (SIMS).
AB - A versatile uhv system was designed in order to enable the preparation of thin films of different materials and their analysis to be undertaken. It includes various sources for evaporation: a high-power electron gun, conventional crucibles and Knudsen cells. An airlock is available for fast transfer of prepared films and new substrates. By a special sample holder the thin films can be manipulated to different positions for structural analysis by reflection high energy electron diffraction (RHEED), and for chemical analysis by Auger electron spectroscopy (AES) and secondary ion mass spectrometry (SIMS).
UR - http://www.scopus.com/inward/record.url?scp=0018053208&partnerID=8YFLogxK
U2 - 10.1016/0042-207X(78)90003-9
DO - 10.1016/0042-207X(78)90003-9
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AN - SCOPUS:0018053208
SN - 0042-207X
VL - 28
SP - 523
EP - 526
JO - Vacuum
JF - Vacuum
IS - 12
ER -