2. An uhv system for in situ preparation and analysis of thin films and surfaces

Y. Shapira; E. Grünbaum

doi:10.1016/0042-207X(78)90003-9

2. An uhv system for in situ preparation and analysis of thin films and surfaces

Y. Shapira^*, E. Grünbaum

^*Corresponding author for this work

Department of Electrical Engineering - Physical Eng.

Research output: Contribution to journal › Article › peer-review

Abstract

A versatile uhv system was designed in order to enable the preparation of thin films of different materials and their analysis to be undertaken. It includes various sources for evaporation: a high-power electron gun, conventional crucibles and Knudsen cells. An airlock is available for fast transfer of prepared films and new substrates. By a special sample holder the thin films can be manipulated to different positions for structural analysis by reflection high energy electron diffraction (RHEED), and for chemical analysis by Auger electron spectroscopy (AES) and secondary ion mass spectrometry (SIMS).

Original language	English
Pages (from-to)	523-526
Number of pages	4
Journal	Vacuum
Volume	28
Issue number	12
DOIs	https://doi.org/10.1016/0042-207X(78)90003-9
State	Published - Dec 1978

Access to Document

10.1016/0042-207X(78)90003-9

Cite this

@article{dcf901383cd648ee9d03c5b9a01bbf9b,

title = "2. An uhv system for in situ preparation and analysis of thin films and surfaces",

abstract = "A versatile uhv system was designed in order to enable the preparation of thin films of different materials and their analysis to be undertaken. It includes various sources for evaporation: a high-power electron gun, conventional crucibles and Knudsen cells. An airlock is available for fast transfer of prepared films and new substrates. By a special sample holder the thin films can be manipulated to different positions for structural analysis by reflection high energy electron diffraction (RHEED), and for chemical analysis by Auger electron spectroscopy (AES) and secondary ion mass spectrometry (SIMS).",

author = "Y. Shapira and E. Gr{\"u}nbaum",

note = "Funding Information: We are grateful to Professor G Deutscher for his support during the development of this project. The project was supported by a grant from the United States-Israel Binational Science Foundation (BSF), Jerusalem, Israel, by a grant from the National Council for Research and Development, Israel and the KFA Jtilich, Germany and by a grant from the Israeli Center for Absorption of Scientists. The technical help of S Carmeli and Y Saltzman is greatly appreciated.",

year = "1978",

month = dec,

doi = "10.1016/0042-207X(78)90003-9",

language = "אנגלית",

volume = "28",

pages = "523--526",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier Ltd.",

number = "12",

}

TY - JOUR

T1 - 2. An uhv system for in situ preparation and analysis of thin films and surfaces

AU - Shapira, Y.

AU - Grünbaum, E.

N1 - Funding Information: We are grateful to Professor G Deutscher for his support during the development of this project. The project was supported by a grant from the United States-Israel Binational Science Foundation (BSF), Jerusalem, Israel, by a grant from the National Council for Research and Development, Israel and the KFA Jtilich, Germany and by a grant from the Israeli Center for Absorption of Scientists. The technical help of S Carmeli and Y Saltzman is greatly appreciated.

PY - 1978/12

Y1 - 1978/12

N2 - A versatile uhv system was designed in order to enable the preparation of thin films of different materials and their analysis to be undertaken. It includes various sources for evaporation: a high-power electron gun, conventional crucibles and Knudsen cells. An airlock is available for fast transfer of prepared films and new substrates. By a special sample holder the thin films can be manipulated to different positions for structural analysis by reflection high energy electron diffraction (RHEED), and for chemical analysis by Auger electron spectroscopy (AES) and secondary ion mass spectrometry (SIMS).

AB - A versatile uhv system was designed in order to enable the preparation of thin films of different materials and their analysis to be undertaken. It includes various sources for evaporation: a high-power electron gun, conventional crucibles and Knudsen cells. An airlock is available for fast transfer of prepared films and new substrates. By a special sample holder the thin films can be manipulated to different positions for structural analysis by reflection high energy electron diffraction (RHEED), and for chemical analysis by Auger electron spectroscopy (AES) and secondary ion mass spectrometry (SIMS).

UR - http://www.scopus.com/inward/record.url?scp=0018053208&partnerID=8YFLogxK

U2 - 10.1016/0042-207X(78)90003-9

DO - 10.1016/0042-207X(78)90003-9

M3 - מאמר

AN - SCOPUS:0018053208

VL - 28

SP - 523

EP - 526

JO - Vacuum

JF - Vacuum

SN - 0042-207X

IS - 12

ER -

2. An uhv system for in situ preparation and analysis of thin films and surfaces

Abstract

Access to Document

Other files and links

Fingerprint

Cite this