VST E-Beam Evaporator (Nano)

  • Sergio Bloch (Manager)

Equipment/facility: Equipment

    Equipments Details

    Description

    VST TFDS-680
    Description:
    Capable of heating materials to high temperature, high purity film, very high deposition rates and evaporation of high temperature materials and refractory metals. Can evaporate high melting point materials.

    Materials:
    Au, Ag, Al, Co, Cr, Cu, In, Nb, Ni, Mo, Pd, Pt, Sn, Ta, Ti, W.

    Specification:
    Up to 4‘’ wafers.
    Load lock.
    Rotating sample holder.
    Base pressure 5x10-7 Torr.
    Typical deposition rate: 0.5 Å/sec.
    Full wafer deposition

    ​Location:
    Clean Room, Nano center building.
    Photo associated with equipment - vst_nano.png

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