VST E-Beam Evaporator (Nano)

  • Sergio Bloch (Manager)

Equipment/facility: Equipment

    Equipments Details


    VST TFDS-680
    Capable of heating materials to high temperature, high purity film, very high deposition rates and evaporation of high temperature materials and refractory metals. Can evaporate high melting point materials.

    Au, Ag, Al, Co, Cr, Cu, In, Nb, Ni, Mo, Pd, Pt, Sn, Ta, Ti, W.

    Up to 4‘’ wafers.
    Load lock.
    Rotating sample holder.
    Base pressure 5x10-7 Torr.
    Typical deposition rate: 0.5 Å/sec.
    Full wafer deposition

    Clean Room, Nano center building.
    Photo associated with equipment - vst_nano.png


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