Equipments Details
Description
Manufacturer and model:
AJA International ATC-IM Ion Milling Systems.
Description:
Ion Milling is a physical etching technique whereby the ions of an inert gas are accelerated from a wide beam ion source into the surface of a substrate in a vacuum chamber in order to remove material to some desired depth or underlayer.
Specification:
K&R type beam generator.
Providing large area collimated beam of neutralized ions.
For physical sputtering of almost all materials.
With automatic control of the incident angle between beam and substrate holder.
Location:
Engineering Cleanroom, Wolfson building of Electrical Engineering.
AJA International ATC-IM Ion Milling Systems.
Description:
Ion Milling is a physical etching technique whereby the ions of an inert gas are accelerated from a wide beam ion source into the surface of a substrate in a vacuum chamber in order to remove material to some desired depth or underlayer.
Specification:
K&R type beam generator.
Providing large area collimated beam of neutralized ions.
For physical sputtering of almost all materials.
With automatic control of the incident angle between beam and substrate holder.
Location:
Engineering Cleanroom, Wolfson building of Electrical Engineering.
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