Equipments Details
Description
Description:
A high-resolution direct-write pattern generator, mask, and wafer writing.
Ideal for research and development (R&D) in microelectronics, MEMS, microfluidics, sensors, non-standard substrates, and advanced packing.
Specification:
High-Resolution Mode, front-and backside alignment, absolute position calibration, and an automatic loading system.
Up to 7” photo masks.
4” & 5” standard.
Soda lime/Quartz.
Location:
Engineering Cleanroom, Wolfson Building Electrical Engineering.
A high-resolution direct-write pattern generator, mask, and wafer writing.
Ideal for research and development (R&D) in microelectronics, MEMS, microfluidics, sensors, non-standard substrates, and advanced packing.
Specification:
High-Resolution Mode, front-and backside alignment, absolute position calibration, and an automatic loading system.
Up to 7” photo masks.
4” & 5” standard.
Soda lime/Quartz.
Location:
Engineering Cleanroom, Wolfson Building Electrical Engineering.
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