Heidelberg DWL 66fs

  • Anastasiia Adelberg (Manager)

Equipment/facility: Equipment

    Equipments Details


    A high-resolution direct-write pattern generator, mask, and wafer writing.
    Ideal for research and development (R&D) in microelectronics, MEMS, microfluidics, sensors, non-standard substrates, and advanced packing.

    High-Resolution Mode, front-and backside alignment, absolute position calibration, and an automatic loading system.
    Up to 7” photo masks.
    4” & 5” standard.
    Soda lime/Quartz.

    Engineering Cleanroom, Wolfson Building Electrical Engineering.
    Photo associated with equipment - Heidelberg_DWL66fs.png


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