Equipments Details
Description
Manufacturer and model:
RAITH150
Description:
The Raith150 represents a new and innovative generation of electron-beam writers for R&D application and close the gap between the SEM conversions and expensive production equipment. The Raith 150 is capable of a resolution of about 50 nm.
Specification:
Ultra-high-resolution Electron Beam Lithography.
Automated waferscale e-beam writing.
30 KV exposure and imaging.
Thermal shield.
Unique split room setup.
Location:
Nano center building.
RAITH150
Description:
The Raith150 represents a new and innovative generation of electron-beam writers for R&D application and close the gap between the SEM conversions and expensive production equipment. The Raith 150 is capable of a resolution of about 50 nm.
Specification:
Ultra-high-resolution Electron Beam Lithography.
Automated waferscale e-beam writing.
30 KV exposure and imaging.
Thermal shield.
Unique split room setup.
Location:
Nano center building.
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