Equipments Details
Description
Manufacturer and model:
VINCI TECHNOLOGIES PVD 20.
Description:
Electron beam evaporation is available on a variety of platforms suitable for many applications, including metallization, dielectric coating and optical coating.
Materials:
Au, Ag, Al, Co, Cr, Cu, In, Nb, Ni, Mo, Pd, Pt, Sn, Ta, Ti, W, Al203.
Specification:
Up to 6‘’ wafers.
Load lock.
In situ Ar plasma preclean.
Base pressure E-8 Torr.
Heating up to 350˚C.
Typical deposition rate: 0.5 Å/sec.
Location:
Engineering Cleanroom, Wolfson building of Electrical Engineering.
VINCI TECHNOLOGIES PVD 20.
Description:
Electron beam evaporation is available on a variety of platforms suitable for many applications, including metallization, dielectric coating and optical coating.
Materials:
Au, Ag, Al, Co, Cr, Cu, In, Nb, Ni, Mo, Pd, Pt, Sn, Ta, Ti, W, Al203.
Specification:
Up to 6‘’ wafers.
Load lock.
In situ Ar plasma preclean.
Base pressure E-8 Torr.
Heating up to 350˚C.
Typical deposition rate: 0.5 Å/sec.
Location:
Engineering Cleanroom, Wolfson building of Electrical Engineering.

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