Equipments Details
Description
Manufacturer and model:
Plasma-System-Pico Surface Technology. Electronic Diener.
Description:
Device and wafer surface cleaning treatments procedures, removal of organic residuals and native oxides.
Specification:
Semi automatic control.
Generate frequency: 40kHz (standard); 13.56MHz; 2.45GHz.
Generator power: 0W-200W for 40kHz, infinitely variable.
Process timer.
Pirani gauge.
Gas Supply: Argon and Oxygen.
Location:
Clean Room & E-beam Preparation Room, Nano center building.
Plasma-System-Pico Surface Technology. Electronic Diener.
Description:
Device and wafer surface cleaning treatments procedures, removal of organic residuals and native oxides.
Specification:
Semi automatic control.
Generate frequency: 40kHz (standard); 13.56MHz; 2.45GHz.
Generator power: 0W-200W for 40kHz, infinitely variable.
Process timer.
Pirani gauge.
Gas Supply: Argon and Oxygen.
Location:
Clean Room & E-beam Preparation Room, Nano center building.
×
![]()
Fingerprint
Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.