Diener Plasma (EBL CR)

  • Gidon Jacob (Manager)

Equipment/facility: Equipment

    Equipments Details

    Description

    Manufacturer and model:
    Plasma-System-Pico Surface Technology. Electronic Diener.

    Description:
    Device and wafer surface cleaning treatments procedures, removal of organic residuals and native oxides.

    Specification:
    Semi automatic control.
    Generate frequency: 40kHz (standard); 13.56MHz; 2.45GHz.
    Generator power: 0W-200W for 40kHz, infinitely variable.
    Process timer.
    Pirani gauge.
    Gas Supply: Argon and Oxygen.

    ‚ÄčLocation:
    Clean Room & E-beam Preparation Room, Nano center building.
    Photo associated with equipment - diener.png

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